We are proud that our technology helps saving people's lives by enabling novel plasmonically active microscope slides. See the Nature article by Balaur, E. et al.: Colorimetric histology using plasmonically active microscope slides

This week, for the first time we were able to ship two PHABLE™ lithography systems in one week. Great achievement for the team and sincere gratitude to our trusting customers!

RT @Semiconductor_T: #Eulitha launches #PhableX lithography systems for volume production of photonic products. @Eulitha_AG https://t.co/…

Eulitha is proud to launch PhableX line of photolithography systems for volume production of photonic products. The systems enable low-cost, high-volume production of photonic devices such as waveguides for Augmented Reality (AR).

RT @ManuGaN_UK: Our article "Displacement Talbot lithography for nano-engineering of III-nitride materials" is on the front page of Nature…

Attending the MNE conference this week in Rhodes, Greece. As always this conference presents a good opportunity to catchup with colleagues and customers and meet new ones from Europe and beyond.

We are at the CIOE Exhibition in Shenzhen this week. It is even greater than last year’s. Very lively show!

Eulitha will be sharing their cutting-edge photolithography tools for printing nanoscale periodic structures at the next @CIOE_Shenzhen Exhibition. Join us at booth 2509 and ask us about our latest PhableR 200 DUV tool for 8” full field exposures.

Researchers at @psich_de have printed their first wafer scale patterns on 8 inch wafers using the PhableR 200C tool. This represents an important milestone in the Phable series offering. Their results will be presented at the next MNE conference 2019:

At this year’s International Conference on Nitride Semiconductors, being held in Washington, USA between July 7-12, a number of works are going to be presented that utilized Displacement Talbot Lithography technology of Eulitha. @Materials_MRS

@FBH_News The Fredinand-Braun-Institut of Berlin is going to present their pioneering work at the ICNS conference on Nitride Semiconductors on the use of our PHABLE lithograhy technology in the production of higher efficiency UVB and UVC LEDs.

Eulitha is co-organizing this year’s Standford Advanced Lithography Symposium. We are looking forward to showcasing the latest advancements in our PhableR series photolithography systems.

The Eulitha team is at the CLEO conference in San Jose this week. Stop by our booth to hear about our latest solutions! #lithography #eulitha

Eulitha will be sharing their cutting-edge tools for printing nanoscale periodic structures. Join us at the CLEO Laser Science to Photonic Applications Exhibition in San Jose, California USA. #Eulitha #CLEO #photonics

We are very excited about the progress of our new cleanroom extension. This new facility will provide us with some much needed production capacity as we work to meet the growing demand. #Eulitha #nanopatterning #lithography #nanotechnology

We are excited to introduce our new Business Development Manager Dr. Duane Hudgins! He is already jumping in to help us deliver our world class products to our customers. Welcome to the team Duane!

We had a great time at our annual New Year's dinner after a successful 2018. Thanks to all who made it happen, not the least to Viktoria for the wonderful cake!

RT @startuptickerCH: EULITHA delivers its first new exposure tool to PSI | The Swiss Startup News channel https://t…

New article from Twente using PhableR 100 system to make nanopores in a SiO2 film by sinking Pt nanoparticles Engulfment control of platinum nanoparticles into oxidized silicon substrates for fabrication of dense solid-state nanopore arrays via @IOPscience

RT @AZoNano: @psich_en Receives World’s First 200mm PhableR Photolithography System from @Eulitha_AG https://t.co/…